
DN-1001 Semi-bright Nickel Plating Process
1. The coating has excellent ductility and leveling force, good columnar structure, and is suitable for various multi-layer Ni-Cr coating systems with extremely high corrosion resistance requirements.
2. The continuous operation of the process is good. If it can be combined with regular activated carbon adsorption, there is no need for large-scale treatment under normal circumstances.
3. Additives and solutions are fully compatible with the company's bright nickel system, and there is no need to wash in the subsequent bright nickel process.
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Solution composition and operating conditions
Nickel sulfate 280-320g/l 300g/l boric acid 38-45g/l 40g/L DN-1001A opening agent 9-12 ml/l 1 ml/L DN-1001BN leveler 0.6-2.0 ml/l 10.0 ml/L DN-1001C potential regulator 0.1-0.25 ml/l 0.15 ml/l Y-19 wetting agent 2-5 ml/L 2.5 ml/L pH 3.8-4.2 4 Temperature 50-60 ℃ 55℃ cathode current density 3-8 amps/square decimeter 4.5 amps/square decimeter anode current density 1-3 amps/square decimeter 2.2 amps/square decimeter Voltage ≤ 8V ≤ 8V air stirring 3-6 liters/minute/square decimeter solution surface area, and the solution is evenly distributed
DN-1001 Semi-bright Nickel Plating Process
1. The coating has excellent ductility and leveling force, good columnar structure, and is suitable for various multi-layer Ni-Cr coating systems with extremely high corrosion resistance requirements.
2. The continuous operation of the process is good. If it can be combined with regular activated carbon adsorption, there is no need for large-scale treatment under normal circumstances.
3. Additives and solutions are fully compatible with the company's bright nickel system, and there is no need to wash in the subsequent bright nickel process.
Still deciding? Get samples first, Contact US !
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