• ULTRA Acid Bright Copper Plating Process
ULTRA Acid Bright Copper Plating Process
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ULTRA Acid Bright Copper Plating Process

1. The tolerance of impurities in the plating solution is high, easy to control, and the filling flatness of the coating is excellent. 2. The coating is not easy to produce pinholes, low internal stress and good ductility. 3. The current density range is wide, and the coating filling flatness is as high as 75% to achieve bright effect. 4. The deposition speed is very fast. Under the current density of 4.5 amperes/square decimeter, a copper layer of 1 micron can be plated per minute, thus shortening the plating time. 5. Wide scope of application, can be applied to iron, zinc alloy, copper alloy, plastic and other different types of substrate.

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  • Product Description
  • Solution composition and operating conditions

     

    Copper sulfate195-255g/l
    sulfuric acid50-100g/l
    chloride ion80-100 mg/l
    Ultra  Mu8-10 ml/l
    Ultra  A0.6-0.8 ml/l
    Ultra  B0.4-0.6 ml/l
    Temperature18-35 ℃
    current density1.5-8 amps/square decimeter
    Production maintenance: 
    Ultra  Mu30-50 ml/kH
    Ultra  A50-60 ml/kH
    Ultra  B30-50 ml/kH

     

ULTRA Acid Bright Copper Plating Process

1. The tolerance of impurities in the plating solution is high, easy to control, and the filling flatness of the coating is excellent. 2. The coating is not easy to produce pinholes, low internal stress and good ductility. 3. The current density range is wide, and the coating filling flatness is as high as 75% to achieve bright effect. 4. The deposition speed is very fast. Under the current density of 4.5 amperes/square decimeter, a copper layer of 1 micron can be plated per minute, thus shortening the plating time. 5. Wide scope of application, can be applied to iron, zinc alloy, copper alloy, plastic and other different types of substrate.

Still deciding? Get samples first,  Contact US !

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